The effect of films thickness on structural and optical properties of amorphous Sn2O thin films deposited by ink jet printing method

Billur C. A. , Şahin G., GÜNERİ E. , SAATÇİ B. , SOYLU M. Ç.

Journal of Molecular Structure, cilt.1219, 2020 (SCI Expanded İndekslerine Giren Dergi) identifier


Tin dioxide (Sn2O) thin films were grown from 40 layers to 80 layers on glass substrates at 60 °C by the ink jet printing method after which, an annealing treatment at 400 °C for 60 min. To prepare ink, Sn nanoparticle, ethylene glycol, and glycerin were used. The ink was mixed using Sonics Vibra Cell to obtain a homogeneous solution. The thickness dependences of the structure of thin films were investigated by means of X-ray diffraction. According to XRD, all of the thin films have an amorphous structure. The thickness dependences of optical properties of the thin films were also investigated via UV–Vis-IR measurements from 300 nm to 1100 nm. UV–Vis-IR date depicted that the films have high transparency with 85% in the Vis-IR range. The transmittance decreases when the deposited layer increases from 40 layers to 80 layers that is because of a thickness increase from 99.82 nm to 681 nm. The best result of SnO2 thin films was the one with a transmittance of 90% at 630 nm accompanied at 40 layers. The values of the direct optical bandgap energy changed in the range of 3.35–3.69 eV with film thickness. Additionally, the refractive index, extinction coefficient, real and imaginary dielectric constants, optical conductivity, and skin depth of the thin films were also determined using the transmission and absorption data.