Nickel xanthate thin films (NXTF) were successfully deposited by chemical bath deposition, on to amorphous glass substrates, as well as on p- and n-silicon, indium tin oxide and poly(methyl methacrylate). The structure of the films was analysed by X-ray diffraction (XRD), far-infrared spectrum (FIR), mid-infrared (MIR) spectrum, nuclear magnetic resonance (NMR) and scanning electron microscopy (SEM). These films were investigated from their structural, optical and electrical properties point of view. Uniform distribution of grains was clearly observed from the photographs taken by scanning electron microscope (SEM). The higher transmittance was about 50-60% after optimizing the parameters of deposition time and temperature (4 h, 50 degrees C). The optical bandgap of the NXTF was graphically estimated as 3.90-3.96 eV. The resistivity of the films was calculated as 62.6-90.7 Omega.cm on commercial glass depending on the film thickness and 62.2-74.5 Omega.cm on the other substrates. The MIR and FIR spectra of the films conformed to the literature and their solid powder forms. The expected peaks of nickel xanthate were observed in NMR analysis on glass. The films were dipped into chloroform as organic solvent and were analysed by NMR.