International Conference on Optimization of Electrical and Electronic Equipment (OPTIM), Romanya, 22 - 24 Mayıs 2014, ss.1087-1091
In the present study, alpha-Co(OH)(2) was prepared by a potentiostatic deposition process at -1.0V (vs. Ag/AgCl) onto a nickel electrode by using a aqueous solution of 0.1 M Co(NO3)(2). The structure and surface morphology of the obtained the alpha - Co(OH)(2) were studied by using X-ray diffraction analysis and scanning electron microscopy. XRD data and the scanning electron microscopy images showed that the as-deposited films have an interlaced nanosheet-like surface morphology and possess a regular nanostructure with hexagonal arrays of pores of nanometer dimension and extended periodicity