Site-Specific Placement of Au Nanoparticles on Chemical Nanopatterns Prepared by Molecular Transfer Printing Using Block-Copolymer Films


Onses M. S., Thode C. J., Liu C., Ji S., Cook P. L., Himpsel F. J., ...Daha Fazla

ADVANCED FUNCTIONAL MATERIALS, cilt.21, sa.16, ss.3074-3082, 2011 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 21 Sayı: 16
  • Basım Tarihi: 2011
  • Doi Numarası: 10.1002/adfm.201100300
  • Dergi Adı: ADVANCED FUNCTIONAL MATERIALS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.3074-3082
  • Erciyes Üniversitesi Adresli: Hayır

Özet

Inexpensive, large area patterning of ex-situ synthesized metallic nanoparticles (NPs) at the nanoscale may enable many technologies including plasmonics, nanowire growth, and catalysis. Here, site-specific localization of Au NPs onto nanoscale chemical patterns of polymer brushes is investigated. In this approach, patterns of hydroxyl-terminated poly(styrene) brushes are transferred from poly(styrene-block-methyl methacrylate) (PS-b-PMMA) block copolymer films onto a replica substrate via molecular transfer printing, and the remaining areas are filled with hydroxyl-terminated poly(2-vinyl pyridine) (P2VP-OH) brushes. Citrate-stabilized Au NPs (13 nm) selectively bind to P2VP-OH functionalized regions and the quality of the resulting assemblies depends on high chemical contrast in the patterned brushes. Minimization of the interpenetration of P2VP-OH chains into PS brushes during processing is the key for achieving high chemical contrast. Large area hexagonal arrays of single Au NPs with a placement accuracy of 3.4 nm were obtained on patterns (similar to 20 nm spots, similar to 40 nm pitch) derived from self-assembled cylinder-forming PS-b-PMMA films. Linear arrays of Au NPs were generated on patterns (40 nm lines, 80nm pitch) derived from lamellae-forming PS-b-PMMA that had been directed to assemble on lithographically defined masters.