5TH INTERNATIONAL BLACK SEA MODERN SCIENTIFIC RESEARCH CONGRESS, Rize, Turkey, 8 - 10 November 2023, vol.2, pp.40-46
The electrical properties of thin films are of both practical importance and theoretical interest.
Applications, especially in the solid state field, reveal important new roles for insulators.
The microstructure of thin films depends on the parameters and process of the growth
processes. Many parameters such as film growth, film density, surface area and structure, and
grain size affect the properties of the film. Thin films are sensitively affected by various
deposition parameters such as substrate temperature, structure of the substrate surface, gas
pressure, sputtering power, distance between substrate and target, film thickness, and film
density.
Many coating methods have been developed to deposit oxide coatings on base materials. The
most commonly used methods today are cathodic arc evaporation, ion beam growth, and
magnetron sputtering, which have high deposition rates. These methods are carried out in
plasma (ionized gas environment) obtained in a vacuum environment. The properties of the
coatings may vary depending on the oxygen partial pressure and gas concentration used in the
working environment.
In this study, oxide coating layers obtained by magnetron sputtering method were examined.
The relationship between the electrical properties of insulating films and the way they are
deposited or grown has been investigated.